Cold plasma treatment devices and associated methods

ABSTRACT

A cold plasma helmet application device for delivery of cold plasma benefits to the head of a patient. An appropriate gas is introduced into a helmet receptacle within a containment dome of the helmet. The gas is energized by one or more dielectric barrier devices that receive energy from a pulsed source. The dielectric barrier devices can be configured to match the treatment area. Such a device and method can be used to treat large surface areas treatment sites associated with the head, head trauma, brain cancer, the control of brain swelling with closed head injury or infection, as well as treating male pattern baldness.

CROSS REFERENCE TO RELATED APPLICATIONS

The present application a continuation-in-part of application Ser. No.13/620,104, filed Sep. 14, 2012, entitled “Cold Plasma Treatment Devicesand Associated Methods,” which claims the benefit under 35 U.S.C. §119(e) of U.S. Provisional Patent Application No. 61/535,250, entitled“Harmonic Cold Plasma Devices and Associated Methods”, filed on Sep. 15,2011, which is hereby expressly incorporated by reference in itsentirety.

This application is related to U.S. patent application Ser. No.13/149,744, filed May 31, 2011, U.S. patent application Ser. No.12/638,161, filed Dec. 15, 2009, U.S. patent application Ser. No.12/038,159, filed Feb. 27, 2008, and U.S. Provisional Application No.60/913,369, filed Apr. 23, 2007, each of which are herein incorporatedby reference in their entireties.

BACKGROUND

Field of the Art

The present invention relates to devices and methods for creating coldplasmas, and, more particularly, to cold plasma treatment methods andapplication devices.

Background Art

Atmospheric pressure hot plasmas are known to exist in nature. Forexample, lightning is an example of a DC arc (hot) plasma. Many DC arcplasma applications have been achieved in various manufacturingprocesses, for example, for use in forming surface coatings. Atmosphericpressure cold plasma processes are also known in the art. Most of the ator near atmospheric pressure cold plasma processes are known to utilizepositive to negative electrodes in different configurations, whichrelease free electrons in a noble gas medium.

Devices that use a positive to negative electrode configuration to forma cold plasma from noble gases (helium, argon, etc.) have frequentlyexhibited electrode degradation and overheating difficulties throughcontinuous device operation. The process conditions for enabling a densecold plasma electron population without electrode degradation and/oroverheating are difficult to achieve.

Different applications of cold plasma devices require different sizecold plasma plumes and different dimensional devices to produce thosecold plasma plumes. For example, some medical treatments require a largecold plasma plume to treat a large external wound, while othertreatments require a small cold plasma device that can be coupled to anelongated medical device that can traverse a small body passageway toreach a small internal treatment site.

BRIEF SUMMARY OF THE INVENTION

Cold plasma may be effective in treating wounds with large surfaceareas, such as burns, skin graft donor and recipient sites, and tissueflaps, as well as head trauma, melanoma, and other cancers.Additionally, cold plasma may have utility in the control of brainswelling resulting from closed head injury or meningeal infectionsbecause of the penetration of the radio frequency (RF) fields generatedby the cold plasma device. Cold plasma may also be effective in treatingmale pattern baldness through a marked increase in localized blood flowto the scalp. The term plasma helmet comes from the overall shape of theplasma applicator. It is generally helmet-shaped, covers the head, andhas a series of electrodes (directed toward the target substrate)through which multiple individual plasma discharges are directed.

An embodiment is described of a cold plasma treatment helmet forapplication to a head having contours. The cold plasma treatmentincludes a confinement dome, with the confinement dome configured toconform to the contours of the patient's head. The cold plasma treatmenthelmet also includes a gas injection system having a gas inlet and oneor more gas apertures, with the gas inlet configured to receive gas froman external source, and the gas apertures configured to distribute thegas into the confinement dome. The cold plasma treatment helmet alsoincludes one or more DBD devices disposed in the confinement dome, wherethe one or more DBD devices are coupled to an electrical input port.

An embodiment is also described that includes a method having a step ofreceiving a biocompatible gas within a confinement dome of a cold plasmatreatment helmet, where the biocompatible gas provided via a gasinjection system having a gas inlet and one or more gas apertures. Themethod also includes the step of energizing, by a DBD device, thebiocompatible gas to form a cold plasma within the confinement dome. TheDBD device is coupled to an electrical input port, where the energyprovided via the electrical input port from a cold plasma power supply.The method also includes maintaining the cold plasma within the coldplasma treatment helmet to treat the treatment area.

BRIEF DESCRIPTION OF THE DRAWINGS/FIGURES

FIGS. 1A and 1B are cutaway views of the hand-held atmospheric harmoniccold plasma device, in accordance with embodiments of the presentinvention.

FIGS. 2A and 2B illustrate an embodiment of the cold plasma devicewithout magnets, in accordance with embodiments of the presentinvention.

FIG. 3 is an exemplary circuit diagram of the power supply of a coldplasma device, in accordance with embodiments of the present invention.

FIG. 4 illustrates the generation of cold plasma resulting from adielectric barrier device, in accordance with embodiments of the presentinvention.

FIG. 5 illustrates device cold plasma application device, in accordancewith an embodiment of the present invention.

FIG. 6 illustrates a dielectric barrier discharge device, in accordancewith an embodiment of the present invention.

FIG. 7 illustrates an underside view of a cold plasma helmet applicationdevice, in accordance with an embodiment of the present invention.

FIG. 8 illustrates a top-side view of a cold plasma helmet applicationdevice, in accordance with an embodiment of the present invention.

FIG. 9 illustrates an exemplary cold plasma helmet application device,in accordance with an embodiment of the present invention.

FIG. 10 provides a flowchart of a method of using a cold plasma helmetapplication device, according to an embodiment of the present invention.

DETAILED DESCRIPTION OF THE INVENTION

Non-thermal atmospheric pressure plasmas have attracted a great deal ofenthusiasm and interest by virtue of their provision of plasmas atrelatively low gas temperatures. The provision of a plasma at such atemperature is of interest to a variety of applications, including woundhealing, anti-infective processes, anti-tumorigenic affects, and variousother medical therapies and sterilization.

Cold Plasma Application Device

To achieve a cold plasma, a cold plasma device typically takes as inputa source of appropriate gas and a source of high voltage electricalenergy, and outputs a plasma plume. FIG. 1A illustrates such a coldplasma device. Previous work by the inventors in this research area hasbeen described in U.S. Provisional Patent Application No. 60/913,369,U.S. Non-provisional application Ser. No. 12/038,159 (that has issued asU.S. Pat. No. 7,633,231) and the subsequent continuation applications(collectively “the '369 application family”). The following paragraphsdiscuss further the subject matter from this application family further,as well as additional developments in this field.

The '369 application family describes a cold plasma device that issupplied with helium gas, connected to a high voltage energy source, andwhich results in the output of a cold plasma. The temperature of thecold plasma is approximately 65-120 degrees F. (preferably 65-99 degreesF.), and details of the electrode, induction grid and magnet structuresare described. The voltage waveforms in the device are illustrated at atypical operating point in '369 application family.

In a further embodiment to that described in the '369 application,plasma is generated using an apparatus without magnets, as illustratedin FIGS. 2A and 2B. In this magnet-free environment, the plasmagenerated by the action of the electrodes 61 is carried with the fluidflow downstream towards the nozzle 68. FIG. 2A illustrates a magnet-freeembodiment in which no induction grid is used. FIG. 2B illustrates amagnet-free embodiment in which induction grid 66 is used. FIG. 1Billustrates the same embodiment as illustrated FIG. 2B, but from adifferent view. Although these embodiments illustrate the cold plasma isgenerated from electrode 12, other embodiments do not power the coldplasma device using electrode 12, but instead power the cold plasmadevice using induction grid 66.

In both a magnet and a magnet-free embodiment, the inductance grid 66 isoptional. When inductance grid 66 is present, it provides ionizationenergy to the gas as the gas passes by. Thus, although the inductancegrid 66 is optional, its presence enriches the resulting plasma.

As noted above, the inductance grid 66 is optional. When absent, theplasma will nevertheless transit the cold plasma device and exit at thenozzle 68, although in this case, there will be no additional ionizationenergy supplied to the gas as it transits the latter stage of the coldplasma device.

As noted with respect to other embodiments, magnetic fields can be usedin conjunction with the production of cold plasmas. Where present,magnetic fields act, at least at some level, to constrain the plasma andto guide it through the device. In general, electrically chargedparticles tend to move along magnetic field lines in spiraltrajectories. As noted elsewhere, other embodiments can comprise magnetsconfigured and arranged to produce various magnetic field configurationsto suit various design considerations. For example, in one embodiment asdescribed in the previously filed '369 application family, a pair ofmagnets may be configured to give rise to magnetic fields with opposingdirections that act to confine the plasma near the inductance grid.

Cold Plasma Unipolar High Voltage Power Supply

The '369 application family also illustrates an embodiment of theunipolar high voltage power supply architecture and components usedtherein. The circuit architecture is reproduced here as FIG. 3, and thisuniversal power unit provides electrical power for a variety ofembodiments described further below. The architecture of this universalpower unit includes a low voltage timer, followed by a preamplifier thatfeeds a lower step-up voltage transformer. The lower step-up voltagetransformer in turn feeds a high frequency resonant inductor-capacitor(LC) circuit that is input to an upper step-up voltage transformer. Theoutput of the upper step-up voltage transformer provides the output fromthe unipolar high voltage power supply.

FIG. 3 also illustrates an exemplary implementation of the unipolar highvoltage power supply 310 architecture. In this implementation, a timerintegrated circuit such as a 555 timer 320 provides a low voltage pulsedsource with a frequency that is tunable over a frequency range centeredat approximately 1 kHz. The output of the 555 timer 320 is fed into apreamplifier that is formed from a common emitter bipolar transistor 330whose load is the primary winding of the lower step-up voltagetransformer 340. The collector voltage of the transistor forms theoutput voltage that is input into the lower step-up voltage transformer.The lower step-up transformer provides a magnification of the voltage tothe secondary windings. In turn, the output voltage of the lower step-upvoltage transformer is forwarded to a series combination of a highvoltage rectifier diode 350, a quenching gap 360 and finally to a seriesLC resonant circuit 370. As the voltage waveform rises, the rectifierdiode conducts, but the quench gap voltage will not have exceeded itsbreakdown voltage. Accordingly, the quench gap is an open circuit, andtherefore the capacitor in the series LC resonant circuit will chargeup. Eventually, as the input voltage waveform increases, the voltageacross the quench gap exceeds its breakdown voltage, and it arcs overand becomes a short circuit. At this time, the capacitor stops chargingand begins to discharge. The energy stored in the capacitor isdischarged via the tank circuit formed by the series LC connection.

Continuing to refer to FIG. 3, the inductor also forms the primarywinding of the upper step-up voltage transformer 340. Thus, the voltageacross the inductor of the LC circuit will resonate at the resonantfrequency of the LC circuit 370, and in turn will be further stepped-upat the secondary winding of the upper step-up voltage transformer. Theresonant frequency of the LC circuit 370 can be set to in the highkHz-low MHz range. The voltage at the secondary winding of the upperstep-up transformer is connected to the output of the power supply unitfor delivery to the cold plasma device. The typical output voltage is inthe 10-150 kV voltage range. Thus, voltage pulses having a frequency inthe high kHz-low MHz range can be generated with an adjustablerepetition frequency in the 1 kHz range. The output waveform is shapedsimilar to the acoustic waveform generated by an impulse such as a bellis struck with a hammer. Here, the impulse is provided when the sparkgap (or SCR) fires and produces the voltage pulse which causes theresonant circuits in the primary and secondary sides of the transformerto resonate at their specific resonant frequencies. The resonantfrequencies of the primary and the secondary windings are different. Asa result, the two signals mix and produce the unique ‘harmonic’ waveformseen in the transformer output. The net result of the unipolar highvoltage power supply is the production of a high voltage waveform with anovel “electrical signature,” which when combined with a noble gas orother suitable gas, produces a unique harmonic cold plasma that providesadvantageous results in wound healing, bacterial removal and otherapplications.

The quenching gap 360 is a component of the unipolar high voltage powersupply 310. It modulates the push/pull of electrical energy between thecapacitance banks, with the resulting generation of electrical energythat is rich in harmonic content. The quenching gap can be accomplishedin a number of different ways, including a sealed spark gap and anunsealed spark gap. The sealed spark gap is not adjustable, whileunsealed spark gaps can be adjustable. A sealed spark gap can berealized using, for example, a DECI-ARC 3000 V gas tube from ReynoldsIndustries, Inc. Adjustable spark gaps provide the opportunity to adjustthe output of the unipolar high voltage power supply and the intensityof the cold plasma device to which it is connected. In a furtherembodiment of the present invention that incorporates a sealed (andtherefore non-adjustable) spark gap, thereby ensuring a stable plasmaintensity.

In an exemplary embodiment of the unipolar high voltage power supply, a555 timer 320 is used to provide a pulse repetition frequency ofapproximately 150-600 Hz. As discussed above, the unipolar high voltagepower supply produces a series of spark gap discharge pulses based onthe pulse repetition frequency. The spark gap discharge pulses have avery narrow pulse width due to the extremely rapid discharge ofcapacitive stored energy across the spark gap. Initial assessments ofthe pulse width of the spark gap discharge pulses indicate that thepulse width is approximately 1 nsec. The spark gap discharge pulse traincan be described or modeled as a filtered pulse train. In particular, asimple resistor-inductor-capacitor (RLC) filter can be used to model thecapacitor, high voltage coil and series resistance of the unipolar highvoltage power supply. In one embodiment of the invention, the spark gapdischarge pulse train can be modeled as a simple modeled RLC frequencyresponse centered in the range of around 100 MHz. Based on the pulserepetition frequency of 192 Hz, straightforward signal analysisindicates that there would be approximately 2,000,000 individualharmonic components between DC and 400 MHz.

In another embodiment of the unipolar high voltage power supplydescribed above, a 556 timer or any timer circuit can be used in placeof the 555 timer 320. In comparison with the 555 timer, the 556 timerprovides a wider frequency tuning range that results in greaterstability and improved cadence of the unipolar high voltage power supplywhen used in conjunction with the cold plasma device.

Cold Plasma Dielectric Barrier Device

Devices, other than the cold plasma device illustrated above in FIG. 1,can also generate cold plasma. For example, cold plasma can also begenerated by a dielectric barrier device, which relies on a differentprocess to generate the cold plasma. As FIG. 4 illustrates, a dielectricbarrier device (DBD) 400 contains one metal electrode 410 covered by adielectric layer 420. The electrical return path 430 is formed by theground 440 that can be provided by the substrate undergoing the coldplasma treatment. Energy for the dielectric barrier device 400 can beprovided by a power supply 450, such as that described above andillustrated in FIG. 2. More generally, energy is input to the dielectricbarrier device in the form of pulsed electrical voltage to form theplasma discharge. By virtue of the dielectric layer, the discharge isseparated from the metal electrode and electrode etching is reduced. Thepulsed electrical voltage can be varied in amplitude and frequency toachieve varying regimes of operation.

In exemplary embodiments, the DBD principle is used to provide devicesand methods for the application of cold plasma to one or more treatmentareas on the head of a patient. The cold plasma application device has ahelmet form, which provides a confinement dome to which an appropriategas (e.g., helium, oxygen, nitrogen and the like, including gascombinations) is received, energized to form a cold plasma and providedin close proximity to the desired treatment area, but prevented fromreaching unintended areas. Due to the close proximity, the energy of thecold plasma may be buffered in order to provide a lower energy coldplasma. In certain embodiments, the cold plasma helmet applicationdevice has support points on the helmet of the patient to ensure thatthe confinement dome suitably mirrors the individual contours of thehead of the particular patient. In the cold plasma helmet applicationdevice, the plasma penetrates to the scalp of the patient. The gas isinjected and passes through the DBD devices, which energize the gas toform a cold plasma. The cold plasma passes through to the scalp, whichuses the scalp as a ground. In certain embodiments, it is theelectromagnetic fields associated with the cold plasma rather thandirect cold plasma contact that can provide a therapeutic effect on thetreatment area, particularly on deeper tissues.

Cold Plasma Helmet Treatment Device

Cold plasma may be effective in treating wounds with large surfaceareas, such as burns, skin graft donor and recipient sites, and tissueflaps, as well as head trauma, brain infections, demyelinating diseases,Parkinsons's disease, Alzheimer's disease, brain cancers, melanoma, andother cancers. Non-thermal plasma may have utility in the control ofbrain swelling resulting from closed head injury or infection because ofthe penetration of the radio frequency (RF) fields generated by the coldplasma device. Cold plasma may also be effective in treating malepattern baldness through a marked increase in localized blood flow tothe scalp. In addition, applications to which cold plasma treatments canbe applied include the treatment of head wounds, hair growth and scalptreatments that benefit from a diminution of scalp bacteria.

As noted above, cold plasma may be used in hair growth treatment. Insuch a treatment, time intervals between the cold plasma treatments maybe selected to optimize stimulation and new hair growth. The process forselection of the time intervals may be based upon the body's response tothe application of cold plasma. The inventors surmise that cold plasmaenhances perifollicular vascularization that promotes hair growth andincreases hair follicle and hair size. An angiogenic response ismarkedly accelerated in tissues treated with gas plasma. Moreover, aquantitative analysis of the microvascular diameters, red blood cellvelocity and microvascular permeability reveal stable perfusion andvascular integrity of the newly developed blood vessels. Hence, theinventors surmise that cold plasma-treated perifollicularvascularization of the scalp will enhance hair growth, follicle andindividual hair size. In addition, nitric oxide has been shown tostimulate angiogenesis in vivo. Nitric oxide is one of the components ofcold plasma. Hence, the inventors further surmise that cold plasmatreatment of the scalp using the helmet will stimulate new hair growth.

As noted above, cold plasma may also be used in scalp disorder treatmentand the treatment of head wounds. In such treatments, different timeintervals between cold plasma treatments may be chosen. For example,depending on the severity of the scalp disorder, time intervals betweenthe treatments may vary, potentially within a single treatment protocol,and with different periodicity to initially combat an infection.Subsequently, an altered periodicity may be adopted to promote healingafterward, depending on the body's response—for example, depending onthe individual's immune response to the cold plasma. Cold plasma hasbeen shown to kill bacteria in vitro and to reduce bacterial load inwounds in vivo. By adjusting the protocol parameters to ensure awell-tolerated treatment with minimal side effects by the individualpatient, a cold plasma treatment using embodiments of the cold plasmahelmet promote wound healing. The cold plasma helmet gives a uniqueability to address the scalp-related disorders when combating infectionand promoting wound healing is desired.

As noted above, cold plasma may also be used in a brain swellingprotocol. In such a treatment, cold plasma has been shown to reduceinflammation in vivo by suppressing the progression of the relateddisease with no tissue damage. It is known that non-thermal plasma is aneffective approach for the treatment of inflammation in skin lesions.The cold plasma helmet is a unique tool that addresses the need for atreatment to reduce inflammation on the scalp.

As noted above, cold plasma may also be used in a demyelinating diseasetreatment protocol. In such a treatment, individually-based treatmenttimes may be used, where the treatment times are adjusted based on thecause of the disease being treated and based on each individual's bodyresponse (and/or autoimmune system) to the specific treatment protocol.Depending on the severity of the condition and body's response to theprotocol, cold plasma treatment effects may be monitored and thetreatment regime adjusted accordingly. For example, after a cold plasmatreatment of the infection, swabs may be taken and the treatment regimecontinues until desired effect of reduced bacterial load is achieved.

As noted above, cold plasma may also be used in a Parkinson's diseaseprotocol. It has been demonstrably shown that cold plasma may denatureproteins. Exposure to RF energy and cold plasma may help to preventaccumulation of the proteins in neurons. Additionally, cold plasma maystimulate neuron activity to prevent motor impairment and potentially orimprove movement-related symptoms. Preferably, a Parkinson's diseasetreatment protocol would be adjustable, where the adjustments may bebased upon the patient's response to the cold plasma treatment, thestage of disease progression, the cold plasma exposure frequency andduration, as well as the level of RF frequency input. Low temperatureatmospheric pressure plasma may break amyloidfibrils into smaller unitsin vitro. Amyloidfibrils are ordered beta-sheet aggregates that areassociated with a number of neurodegenerative diseases such as Alzheimerand Parkinson. Embodiments of the cold plasma helmet provide a uniqueability to address amyloidfibril aggregates since the cold plasma helmetdesign may configure cold plasma delivery shapes and desired therapeuticdoses of plasma directly to the scalp. The cold plasma helmet protocolmay also affect proteins (e.g., inactivation of enzymes, loss ofactivity, modification of secondary molecular structure), depending onthe cold plasma treatment conditions. Thus, embodiments of the coldplasma helmet provide a specialized device with an associated method andmechanism of action to influence proteins and prevent the accumulationof the proteins in neurons.

As noted above, cold plasma may also be used in an Alzheimer's diseaseprotocol. In such a protocol, a cold plasma exposure may prevent amyloidprotein buildup, enhance neuron communication, and help to reduceneuroinflammation. Preferably, an Alzheimer's disease treatment protocolwould be adjustable, where the adjustments may be based upon thepatient's response to the cold plasma treatment, the stage of diseaseprogression, the cold plasma exposure frequency and duration, as well asthe level of RF frequency input. Additionally, anti-inflammatory effectsof cold plasma treatments may be beneficial to address neuroinflammationusing embodiments of the cold plasma helmet.

In an embodiment, a device and method are provided for the applicationof cold plasma to a treatment area on the head of a patient. Such adevice may be referred to as a cold plasma helmet application device,where the term cold plasma helmet comes from the overall shape of theplasma applicator. FIG. 5 illustrates an exemplary embodiment of such acold plasma helmet application device 500. Cold plasma helmetapplication device is generally helmet-shaped, covers the head, and hasa series of dielectric barrier discharge (DBD) electrodes (directedtoward the head of the patient) through which multiple individual plasmadischarges are directed. More specifically, in an exemplary embodiment,the cold plasma helmet application device 500 has a confinement dome 510to which an appropriate biocompatible gas (e.g., helium, oxygen,nitrogen or their combination) is received via gas inlet 520. Gas isthen distributed to helmet receptacle 550 via gas injection system 560that has one or more apertures 530. In an embodiment of gas injectionsystem 560, a vinyl tubing configuration is shown. Other means of gasdistribution fall within the scope of embodiments of the presentinvention. The gas is energized to form a non-thermal plasma using oneor more dielectric discharge barrier devices (an embodiment shown inFIG. 6) that are located in dome layer 540. Dome layer 540 is made ofany suitable dielectric material. Dome layer 540 also has apertures thatpermit the flow of gas through dome layer 540. The resulting cold plasmapasses through to the desired treatment area (e.g., the scalp) on thehead of the patient, but prevented from reaching unintended areas (e.g.,other parts of the head that are not undergoing treatment). Due to theclose proximity, the energy of the cold plasma can be buffered in orderto provide a lower energy cold plasma. The cold plasma helmetapplication device 500 has support points on the head of the patient toensure that the confinement dome 510 provides the appropriatefunctionality for the individual contours of the head of the particularpatient. The confinement dome 510 can be made using moldable materialthat prevents penetration by the plasma. Such moldable materials includepolyethylene, silicone, or room temperature vulcanizing (RTV) productsfor example.

FIG. 6 illustrates an exemplary dielectric barrier discharge (DBD)device 600. Dielectric barrier discharge (DBD) device 600 includeselectrode 630 within a module housing 620. Electrode 630 is covered by adielectric disk 640. Electrode 630 is connected to a power supply cable610. In an embodiment of DBD device 600, dielectric disk 640 ispositioned at one end of module housing 620, while the power supplycable 610 enters the module housing 620 at the other end. Although FIG.6 illustrates module housing 620 is cylindrical in shape, any shapefalls within the scope of the present invention.

FIG. 7 illustrates the underside of an exemplary cold plasma helmetapplication device 700. In cold plasma helmet application device 700, anumber of DBD devices 710 are distributed throughout the inside, withthe electrodes 720 of the DBD devices 710 being covered by transparentsilicon dioxide disks 730. Wire grid 740 is also shown that connects theindividual DBD devices 710 to a port (not shown) that providesconnectivity to an appropriate external cold plasma power supply. Inthis embodiment, electrodes 720 can be made from any suitable metallicmaterial, such as brass and may be plated with one or more layers ofexotic metals such as nickel, silver and/or gold.

FIG. 8 illustrates the top-side of exemplary cold plasma helmetapplication device 700. The DBD devices 710 are distributed throughoutthe inside, with the wire grid 740 also visible in this view. Gasinjection system 810 is shown in this view.

FIG. 9 illustrates an exemplary cold plasma helmet application device inoperation, with the visible non-thermal plasma shown. The layout of DBDdevices in the cold plasma helmet application device can lead to overlapof the plasma fields in the treatment area of the head of the patientinvolved.

The cold plasma helmet arrangement combines some aspects of dielectricbarrier discharge (DBD) plasmas with atmospheric pressure plasma jets(APPJ) to create a unique effect. DBD plasmas are generally created in anon-equilibrium mode by passing electrical discharges over a smalldistance through ambient air. The electrode shape for a DBD plasma isgenerally demonstrated as a flat disk shape, or any shape of essentiallytwo dimensions. APPJ may be generated as equilibrium or non-equilibriumplasmas but involve direct contact between the plasma energy source(electrode array) and the feed gas, generally in three dimensions (e.g.,pin-in-tube electrode, cylindrical electrode). In this embodiment, aflat, plate-like, two-dimensional electrode is separated from a feed gasby a dielectric barrier, thus separating the electrode from the gas yetcausing an ionized gas stream to exit the device in a controlled manner.This provides for a broad surface of plasma generation with the benefitof feed gas control allowing for subsequent optimization of the plasmachemistry and biological effects. The harmonic cold plasma power sourcedesign allows for this high level of ionization without substantialtemperature rise. The combined effect of multiple simultaneous RFwaveforms increases the ionization level of the gas while maintaininglow overall gas temperatures. This device can be powered by the samepower supply unit as the '369 patent family, or any other suitable coldplasma power supply unit.

The multiple gas apertures and regional tunability that comes fromhaving many electrodes spread throughout the interior of embodiments ofthe cold plasma helmet application device allows for specific, optimizedtreatment protocols (including protocols to address hair growth, headwounds, scalp disorder, brain swelling, demyelinating disease,Parkinson's disease, Alzheimer's disease, and the like). Usingindividual switches for each DBD device provides the ability to adjustthe number of electrodes, or specific regions, of the cold plasma helmetapplication device that are active (i.e., that produce cold plasma) atany given time, according to the specific needs of a particularprescribed protocol. A controller may be coupled to the individualswitches to assist in effecting the spatial tunability. By adjusting thespatial and temporal properties of the plasma application, treatmentprotocol tailoring is made possible. Additionally, unlike other devices,embodiments of the cold plasma helmet application device may beconfigured to securely fit a human skull without additional modificationor means of securing a non-form-fitting device.

In further embodiments of the present invention, the layout of the DBDdevices can be reconfigurable to address different treatment areas ofthe head of a patient. Re-configurability can be achieved by enablingeach of the individual DBD devices be easily removable, as required. Inan alternative embodiment, the electrical connectivity of the individualDBD devices can be adjusted so that particular DBD devices areactivated, while others are not energized with electrical power. In afurther embodiment, the overall voltage, frequency content, and dutycycle supplied to the DBD devices from the external cold plasma supplycan be adjusted in accordance with a treatment protocol strategy.

Cold Plasma Helmet Method

FIG. 10 provides a flowchart of an exemplary method 1000 use of a coldplasma helmet application device, according to an embodiment of thepresent invention.

The process begins at step 1010. In step 1010, a biocompatible gas isreceived in a receptacle of the cold plasma helmet application device.

In step 1020, a biocompatible gas is energized to form a cold plasmawithin a cold plasma helmet application device, the cold plasma helmetapplication device having a contour conforming to a head of a patientthat includes a treatment area. The biocompatible gas is energized byone or more DBD devices that are disposed within the cold plasma helmetapplication device in close proximity to the treatment area. In certainembodiments, the one or more DBD devices are selected to regionallytailor the provision of the cold plasma to the treatment area as part ofthe particular treatment protocol involved.

In step 1030, the cold plasma is maintained within the cold plasmahelmet application device to treat the treatment area in accordance withan appropriate protocol. Appropriate treatment protocols includeprotocols that address hair growth, head wounds, scalp disorder, brainswelling, demyelinating disease, Parkinson's disease, and Alzheimer'sdisease.

At step 1040, method 1000 ends.

It is to be appreciated that the Detailed Description section, and notthe Summary and Abstract sections, is intended to be used to interpretthe claims. The Summary and Abstract sections may set forth one or morebut not all exemplary embodiments of the present invention ascontemplated by the inventor(s), and thus, are not intended to limit thepresent invention and the appended claims in any way.

The present invention has been described above with the aid offunctional building blocks illustrating the implementation of specifiedfunctions and relationships thereof. The boundaries of these functionalbuilding blocks have been arbitrarily defined herein for the convenienceof the description. Alternate boundaries can be defined so long as thespecified functions and relationships thereof are appropriatelyperformed.

The foregoing description of the specific embodiments will so fullyreveal the general nature of the invention that others can, by applyingknowledge within the skill of the art, readily modify and/or adapt forvarious applications such specific embodiments, without undueexperimentation, without departing from the general concept of thepresent invention. Therefore, such adaptations and modifications areintended to be within the meaning and range of equivalents of thedisclosed embodiments, based on the teaching and guidance presentedherein. It is to be understood that the phraseology or terminologyherein is for the purpose of description and not of limitation, suchthat the terminology or phraseology of the present specification is tobe interpreted by the skilled artisan in light of the teachings andguidance.

The breadth and scope of the present invention should not be limited byany of the above-described exemplary embodiments, but should be definedonly in accordance with the following claims and their equivalents.

What is claimed is:
 1. A method comprising: receiving a biocompatiblegas within a confinement dome of a cold plasma treatment helmet, thebiocompatible gas provided via a gas injection system, having a gasinlet and one or more gas apertures, the one or more gas aperturesconfigured to distribute the biocompatible gas into a receptacle of theconfinement dome, and wherein the confinement dome is configured toconform to contours of a head of a patient; energizing, by a dielectricbarrier device (DBD) device, the biocompatible gas to form a cold plasmawithin the receptacle of the confinement dome, the DBD device beingcoupled to an electrical input port, the energy provided via theelectrical input port from a cold plasma power supply, and whereinenergizing further includes closing a switch between the DBD device andthe electrical input port; and maintaining the cold plasma within thecold plasma treatment helmet to treat a treatment area.
 2. The method ofclaim 1, wherein the maintaining includes conforming to a hair growthtreatment protocol.
 3. The method of claim 2, wherein the maintainingincludes selecting one or more time intervals of cold plasma treatmentin accordance with the hair growth treatment protocol.
 4. The method ofclaim 2, wherein the energizing includes energizing one or more DBDdevices by closing respective one or more switches associated with theone or more DBD devices, the one or more DBD devices being selected toregionally tailor a provision of the cold plasma to the treatment areaas part of the hair growth treatment protocol.
 5. The method of claim 1,wherein the maintaining includes conforming to a scalp disordertreatment protocol.
 6. The method of claim 5, wherein the maintainingincludes selecting one or more time intervals of cold plasma treatmentin accordance with the scalp disorder treatment protocol.
 7. The methodof claim 5, wherein the energizing includes energizing one or more DBDdevices by closing, respective one or more switches associated with theone or more DBD devices, the one or more DBD devices being selected toregionally tailor a provision of the cold plasma to the treatment areaas part of the scalp disorder treatment protocol.
 8. The method of claim1, wherein the maintaining includes conforming to a brain swellingtreatment protocol.
 9. The method of claim 8, wherein the maintainingincludes selecting one or more time intervals of cold plasma treatmentin accordance with the brain swelling treatment protocol.
 10. The methodof claim 8, wherein the energizing includes energizing one or more DBDdevices by closing respective one or more switches associated with theone or more DBD devices, the one or more DBD devices being selected toregionally tailor a provision of the cold plasma to the treatment areaas part of the brain swelling treatment protocol.
 11. The method ofclaim 1, wherein the maintaining includes conforming to a demyelinatingdisease treatment protocol.
 12. The method of claim 11, wherein themaintaining includes selecting one or more time intervals of cold plasmatreatment in accordance with the demyelinating disease treatmentprotocol.
 13. The method of claim 11, wherein the energizing includesenergizing one or more DBD devices by closing respective one or moreswitches associated with the one or more DBD devices, the one or moreDBD devices being selected to regionally tailor a provision of the coldplasma to the treatment area as part of the demyelinating diseasetreatment protocol.
 14. The method of claim 1, wherein the maintainingincludes conforming to a Parkinson's disease tremors alleviationtreatment protocol.
 15. The method of claim 14, wherein the maintainingincludes selecting one or more time intervals of cold plasma treatmentin accordance with the Parkinson's disease tremors alleviation treatmentprotocol.
 16. The method of claim 14, wherein the energizing includesenergizing one or more DBD devices by closing respective one or moreswitches associated with the one or more DBD devices, the one or moreDBD devices being selected to regionally tailor a provision of the coldplasma to the treatment area as part of the Parkinson's disease tremorsalleviation treatment protocol.
 17. The method of claim 1, wherein themaintaining includes conforming to an Alzheimer's disease treatmentprotocol.
 18. The method of claim 17, wherein the maintaining includesselecting one or more time intervals of cold plasma treatment inaccordance with the Alzheimer's disease treatment protocol.
 19. Themethod of claim 17, wherein the energizing includes energizing one ormore DBD devices by closing respective one or more switches associatedwith the one or more DBD devices, the one or more DBD devices beingselected to regionally tailor a provision of the cold plasma to thetreatment area as part of the Alzheimer's disease treatment protocol.20. The method of claim 1, wherein the maintaining includes conformingto a head wound treatment protocol.